It has a higher melting point of all metals and is used for the processing material, making it suitable for applications with very high temperatures. It is also characterized by its extraordinarily low coefficient of thermal expansion and high dimensional stability. Its high level of electrical conductivity and low diffusion into adjacent layers make tungsten an important component in thin-film transistors.
Tungsten Bar Grade WB-2 Applications
Production of heating elements.
It is used as an electrode in the metal industry.
| Description | Value - Unit | Specification |
|---|---|---|
| Density g/cm3 | 18.5 | |
| Elastic Limit kg/cm2 | 5863.37 | |
| Maximum load to traction kg/cm2 | 8463.64 | |
| Elongation over 25mm % | 6 | |
| Brinell hardness | 275 |
| Description | Value - Unit | Specification |
|---|---|---|
| Thermal conductivity K/mK | 100 | |
| Electrical Conductivity >14% IACS | 177W |
| Element | Percentage % |
|---|---|
| Tungsten - W | 97.00 max |
| Nickel - Ni | 2.10 max |
| Iron - Faith | 0.90 max |
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